Papers - ENTA YOSHIHARU
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Atomic Hydrogen Etching of Silicon-Incorporated Diamond-Like Carbon Films Prepared by Pulsed Laser Deposition (共著)
H. Nakazawa, H. Sugita, Y. Enta, M. Suemitsu, K. Yasui, T. Ito, T. Endo, Y. Narita, M. Mashita
Diamond & Related Materials 18 831 - 834 2009.1
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Initial oxidation of Si(110) as studied by real-time synchrotron-radiation x-ray photomission spectroscopy (共著)
M. Suemitsu, Y. Yamamoto, H. Togashi, Y. Enta, A. Yoshigoe, Y. Teraoka
Journal of Vacuum Science and Technology B27 547 - 550 2009.1
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Thin-Film Deposition of Silicon-Incorporated Diamond-Like Carbon by Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane as a Silicon Source (共著)
Hideki Nakazawa, Yuhki Asai, Takeshi Kinoshita, Maki Suemitsu, Toshimi Abe, Kanji Yasui, Takashi Itoh, Tetsuo Endoh, Yuzuru Narita, Atsushi Konno, Yoshiharu Enta, Masao Mashita
Japanese Journal of Applied Physics 47 ( 11 ) 8491 - 8497 2008.11
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In-Situ Observation of Wet Oxidation Kinetics on Si(100) via Ambient Pressure X-ray Photoemission Spectroscopy（共著）
M. Rossi他
Journal of Applied Physics 103 044104 2008.2
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Real-Time Observation of the Dry Oxidation of the Si(100) Surface with Ambient Pressure X-ray Photoelectron Spectroscopy（共著）
Y. Enta他
Applied Physics letters 92 012110 2008.1
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Real-Time Observation of Initial Thermal Oxidation on Si(110)-16×2 Surfaces by O1s Photoemission Spectroscopy Using Synchrotron Radiation（共著）
M. Suemitsu他
Japanese Journal of Applied Physics 46 1888 - 1890 2007.4
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Real-Time Observation of Initial Thermal Oxidation on Si(110)-16x2 Surface by Photoemission Spectroscopy（共著）
M. Suemitsu他
ECS Transactions 3 311 - 316 2006.11
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ALS in Berkeley 滞在雑記
遠田義晴
Photon Factory News 24 ( 2 ) 55 - 57 2006.8
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Integrated Description for Random-Adsorption and 2D-Island Growth Kinetics in Thin Film Growth: Autocatalytic-Reaction Model and Kinetic Monte-Carlo Simulation（共著）
Hideaki Togashi , Yoshiharu Enta, Maki Suemitsu
Applied Surface Science 252 5900 - 5906 2006.6
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Oxynitridation of Si(100) surface with thermally excited N2O gas（共著）
Y. Enta, K. Suto, S. Takeda, H. Kato, Y. Sakisaka
Thin Solid Films 500 129 - 132 2006.4
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Si 2p core-level spectra for oxynitride on Si(100) with plasma-excited N2O（共著）
Y. Enta, K. Suto, H. Kato, Y. Sakisaka
Photon Factory Activity Report 22 ( B ) 79 - 79 2005.11
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Soft X-ray fluorescence spectroscopy of FexCo1-xSi（共著）
N. Nakajima他
Photon Factory Activity Report 22 ( B ) 102 - 102 2005.11
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XPS study of the initial oxidation stage on HF-treated Si(100) surfaces（共著）
F. Hirose他
Photon Factory Activity Report 22 ( B ) 82 - 82 2005.11
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N2Oガス気相熱励起法によるシリコン酸窒化膜の形成（共著）
遠田義晴,武田創太郎
電子情報通信学会論文誌 J87-C 590 - 591 2004.7
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Si初期酸窒化のリアルタイム光電子分光
遠田義晴
ナノテクノロジーと高分解能電子分光PF研究会プロシーディング 2003.12
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Structure and Thermal Stability of the Chemical Bondings of Diamond-Like Carbon (DLC) Films Prepared by RF Magnetron Sputtering"jointly worked"
T. Mikami, H. Nakazawa, Y. Enta, M. Suemitsu, M. Mashita
Journal of The Surface Science Society of Japan 24 411 - 416 2003.7
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Structure, Chemical Bonding and These Thermal Stabilities of Diamond-Like Carbon (DLC) Films by RF Magnetron Sputtering（共著）
H. Nakazawa, T. Mikami, Y. Enta, M. Suemitsu, M. Mashita
Japanese Journal of Applied Physics 42 L676 - L679 2003.6